On the Fly Ellipsometry Imaging for Process Deviation Detection

Spectroscopic ellipsometry is a very sensitive optical metrology technique commonly used in semiconductor manufacturing lines to accurately measure the thickness and refractive index of different layers present on specific dedicated targets wafers. In parallel, defectivity techniques are widely implemented production inspect significant amount dies representative full wafer detect physical patterning defects. A new approach can then simply emerge which apply at or die scale. This strategy, frontier between field expected bring solutions for certain types process deviation. our case, ellipsometry’s response was collected large areas product wafers capture deviations such as film properties, thickness, variation. an innovative strategy that relies model-less drifts, using sensitivity material properties design architecture variations. this paper, we will three industrial cases.